TY - JOUR Yu-Hao Tsai; Du Zhang; Mingmei WangT1 - Silicon Nitride Etch via Oxidation Reaction in Fluorocarbon/Oxygen Plasma: A First-Principle Study JO - Journal of Microelectronic Manufacturing VL - 1 Y1 - 2018/09/30 UR - http://www.jommpublish.org/p/183/14/ L1 - http://www.jommpublish.org/jomm_data/publish/94/5A/CC/5267C34568B568559690407346/10.33079.jomm.18010102_BIns4o7.pdf DO - 10.33079/jomm.18010102 ER -