TY - JOUR Xiaoting Li; Rui Chen; Lei Qu; Xuanmin Zhu; Jing Zhang; Yanrong Wang; Shuhua Wei; Jiang Yan; Yayi WeiT1 - Analysis of Current Research Status of Plasma Etch Process Model JO - Journal of Microelectronic Manufacturing VL - 1 Y1 - 2018/09/30 UR - http://www.jommpublish.org/p/183/16/ L1 - http://www.jommpublish.org/jomm_data/publish/2A/D0/9E/E6EC864196AFDC1541947466E1/10.33079.jomm.18010104_Vuj61Ro.pdf DO - 10.33079/jomm.18010104 ER -