TY - JOUR Xu Ma; Zhiqiang Wang; Gonzalo R. ArceT1 - Compressive Sensing Approaches for Lithographic Source and Mask Joint Optimization JO - Journal of Microelectronic Manufacturing VL - 1 Y1 - 2018/12/13 UR - http://www.jommpublish.org/p/183/18/ L1 - http://www.jommpublish.org/jomm_data/publish/48/A3/E1/6F5FF340E19E59DF066A0CC47F/10.33079.jomm.18010202_iFPtnVb.pdf DO - 10.33079/jomm.18010202 ER -