TY - JOUR Mark NeisserT1 - The 2017 IRDS Lithography Roadmap JO - Journal of Microelectronic Manufacturing VL - 1 Y1 - 2018/12/27 UR - http://www.jommpublish.org/p/183/20/ L1 - http://www.jommpublish.org/jomm_data/publish/68/0F/90/B2C1014E2D8D8DCDC30317D1BA/10.33079.jomm.18010204_kgfKC6x.pdf DO - 10.33079/jomm.18010204 ER -