TY - JOUR Enming Shang; Yu Ding; Wenqiao Chen; Shaojian Hu; Shoumian ChenT1 - The Effect of Fin Structure in 5 nm FinFET Technology JO - Journal of Microelectronic Manufacturing VL - 2 Y1 - 2019/12/25 UR - http://www.jommpublish.org/p/183/44/ L1 - http://www.jommpublish.org/jomm_data/publish/FD/A5/3C/FD22E94A56A6F248835F13A5A9/10.33079.jomm.19020405.pdf DO - 10.33079/jomm.19020405 ER -