@Article{jomm.19020406,
AUTHOR = {Yanli Li; Qiang Wu; Shoumian Chen},
TITLE = {A Simulation Study for Typical Design Rule Patterns in 5 nm Logic Process with EUV Photolithographic Process},
JOURNAL = {Journal of Microelectronic Manufacturing},
VOLUME = {2},
YEAR = {2019},
PAGES = {19020406},
URL = {http://www.jommpublish.org/p/183/40/},
DOI = {10.33079/jomm.19020406}
}