TY  - JOUR
Yijiang Shen; Zhenrong ZhangT1  - Variational Level-set Formulation for Lithographic Source and Mask Optimization
JO  - Journal of Microelectronic Manufacturing
VL  - 1
Y1  - 2018/12/20
UR  - http://www.jommpublish.org/p/183/19/
L1  - http://www.jommpublish.org/jomm_data/publish/46/1C/C4/3AB4B74A528BDFEF15854266BA/10.33079.jomm.18010203.pdf
DO  - 10.33079/jomm.18010203
ER  -