TY  - JOUR
Mark NeisserT1  - The 2017 IRDS Lithography Roadmap
JO  - Journal of Microelectronic Manufacturing
VL  - 1
Y1  - 2018/12/27
UR  - http://www.jommpublish.org/p/183/20/
L1  - http://www.jommpublish.org/jomm_data/publish/68/0F/90/B2C1014E2D8D8DCDC30317D1BA/10.33079.jomm.18010204_kgfKC6x.pdf
DO  - 10.33079/jomm.18010204
ER  -