TY  - JOUR
Lei Qu; Rui Chen; Xiaoting Li; Jing Zhang; Yanrong Wang; Shuhua Wei; Jiang Yan; Yayi WeiT1  - Development and Prospect of Process Models and Simulation Methods for Atomic Layer Deposition
JO  - Journal of Microelectronic Manufacturing
VL  - 2
Y1  - 2019/06/26
UR  - http://www.jommpublish.org/p/183/30/
L1  - http://www.jommpublish.org/jomm_data/publish/47/F9/61/CC682A47D1B3D5456324BC910E/10.33079.jomm.19020204.pdf
DO  - 10.33079/jomm.19020204
ER  -