TY  - JOUR
Jeff ShuT1  - Innovation on Line Cut Methods of Self-aligned Multiple Patterning
JO  - Journal of Microelectronic Manufacturing
VL  - 2
Y1  - 2019/09/25
UR  - http://www.jommpublish.org/p/183/32/
L1  - http://www.jommpublish.org/jomm_data/publish/A2/BF/46/059DA844FBA57A0C4137132883/10.33079.jomm.19020301.pdf
DO  - 10.33079/jomm.19020301
ER  -