TY  - JOUR
Man Gu; Wenjun Li; Haiting Wang; Owen HuT1  - FinFET Performance Enhancement by Source/Drain Cavity Structure Optimization
JO  - Journal of Microelectronic Manufacturing
VL  - 3
Y1  - 2020/06/08
UR  - http://www.jommpublish.org/p/183/52/
L1  - http://www.jommpublish.org/jomm_data/publish/C1/BF/48/A550BB49A19E57299E1FC29A4E/10.33079.jomm.20030201.pdf
DO  - 10.33079/jomm.20030201
ER  -