CN: DemoJournal-CN
ISSN: DemoJournal-ISSN
Research Article Archive • Versions 3 Vol 2 (3) : 19020406 2019
Download
A Simulation Study for Typical Design Rule Patterns in 5 nm Logic Process with EUV Photolithographic Process
Yanli Li, Qiang Wu, Shoumian Chen
： 2019 - 10 - 17
： 2019 - 12 - 25
1794 40 0
CSCD  ·  Badiu Scholar
References
Journal of Microelectronic Manufacturing

  • Copyright@JoMMPublish