Editor-in-Chief:

Prof. Tianchun Ye, IMECAS, China

Co-Editor-in-Chief:

Prof. Yayi Wei, IMECAS, China

Editorial Board:

Dr. Gandharv Bhatara, Mentor Graphics, U.S.A.

Dr. Jason Cain, AMD, U.S.A.

Prof. Dapeng Chen, IMECAS, China

Prof. Huigao Duan, Hunan University, China

Dr. Eduard Hoeberichts, UniqIC, Neitherland

Dr. Owen Hu, GLOBALFOUNDRIES, U.S.A.

Prof. Li Jiang, Tuskegee University, U.S.A.

Dr. Bert Jan Kampherbeek, MAPPER Lithography, Netherlands

Dr. Kafai Lai, IBM, U.S.A.

Dr. Shiuh-Wuu Lee, U.S.A.

Dr. Yanzun Li, HJL Lithography, U.S.A.

Dr. Jinping Liu, GLOBALFOUNDRIES, U.S.A.

Prof. Ming Liu, IMECAS, China  

Prof. Xinyu Liu, IMECAS, China

Dr. Laurent Pain, CEA/LETI, France

Prof. David Pan, The University of Texas at Austin, U.S.A.

Prof. Kin-Leong Pey, Singapore University of Technology and Design, Singapore

Prof. Yijiang Shen, Guangdong University of Technology, China

Dr. Abhishek Vikram, Anchor Semiconductor, U.S.A.  

Dr. Changyong Xiao, IMEC, Belgium  

Mr. Deyuan Xiao, SIMC, China

Dr. Hong Xiao, KLA-Tencor, U.S.A.

Mr. Yanjun Xiao, ASML-Brion, China

Prof. Shisheng Xiong, Fudan University, China

Prof. Jiang Yan, North China University of Technology, China

Dr. Mingmei Wang, TEL, U.S.A.

Prof. Wenwu Wang, IMECAS, China

Prof. Dexin Wu, IMECAS, China  

Dr. Qiang (Ken) Wu, ICRD, China

Prof. Shaofeng Yu, Fudan University, China

Prof. Jianhua Zhao, Institute of Semiconductors, CAS, China

Prof. Yi Zhao, Zhejiang University, China

Prof. Yumei Zhou, IMECAS, China

Dr. Zhimin Zhu, Brewer Science, U.S.A.

Contact:

E-mail: jomm@jommpublish.org