Welcome to Journal of Microelectronic Manufacturing!
News
Classify by discipline

Online ISSN: 2578-3769

jomm@jommpublish.org


Current Issue Archive Advanced Search
Recent Progress of the Integrated Circuit Industry in China ― Overview of the Manufacturing Industry
Authors: Litho World
Keywords:IC Industry;Manufacturing Industry
doi:10.33079/jomm.20030304
2020年,第3卷,第3期:20030304 | PDF
Published: Oct. 8, 2020
Views:204
Abstract: China's IC industry has been flourishing in recent years, huge market demand together with government investments are the major driving forces for this development. The status and development momen...
Study on Simulation and Profile Prediction of Atomic Layer Deposition
Authors: Lei Qu, Chen Li, Jiang Yan et al.
Institution:North China University of Technology
Keywords:Atomic Layer Deposition;process simulation;profile model;temperature fitting;film of HfO2
doi:10.33079/jomm.20030303
2020年,第3卷,第3期:20030303 | PDF
Research Article
Published: Oct. 8, 2020
Views:210
Abstract: The Atomic Layer Deposition process (ALD) is widely used in FinFET, 3D-NAND and other important technologies because of its self-limiting signature and low growth temperature. In recent years, the ...
Recognition and Visualization of Lithography Defects based on Transfer Learning
Authors: Bo Liu, Pengzheng Gao, Libin Zhang et al.
Institution:School of Information, North China University of Technology, Beijing
Keywords:transfer learning;neural network;lithography defects;visualize;Grad-CAM
doi:10.33079/jomm.20030302
2020年,第3卷,第3期:20030302 | PDF
Research Article
Published: Oct. 5, 2020
Views:256
Abstract: Yield control in the integrated circuit manufacturing process is very important, and defects are one of the main factors affecting chip yield. As the process control becomes more and more critical ...
Study of Inverse Lithography Approaches based on Deep Learning
Authors: Xianqiang Zheng, Xu Ma, Shengen Zhang et al.
Institution:Key Laboratory of Photoelectronic Imaging Technology and System of Ministry of Education of China, School of Optics and Photonics, Beijing Institute of Technology, China
Keywords:Computational lithography;inverse lithography technology (ILT);optical proximity correction (OPC);deep learning
doi:10.33079/jomm.20030301
2020年,第3卷,第3期:20030301 | PDF
Research Article
Published: Oct. 7, 2020
Views:290
Abstract: Computational lithography (CL) has become an indispensable technology to improve imaging resolution and fidelity of deep sub-wavelength lithography. The state-of-the-art CL approaches are capable o...
FinFET Performance Enhancement by Source/Drain Cavity Structure Optimization
Authors: Man Gu, Wenjun Li, Haiting Wang et al.
Institution:GLOBALFOUNDRIES Inc. US
Keywords:FinFET performance;parasitic resistance and capacitance;source/drain cavity;cavity implant
doi:10.33079/jomm.20030201
2020年,第3卷,第2期:20030201 | PDF
Published: June 8, 2020
Views:1176
Abstract: Fin field-effect transistor (FinFET) technology has been introduced to the mainstream complementary metal-oxide semiconductor (CMOS) manufacturing for low-power and high-performance applications. H...
High-Pressure Oxidation on Ge: Improvement of Ge/GeO2 Interface and GeO2 Bulk Properties
Authors: ChoongHyun Lee
Institution:Zhejiang University
Keywords:High-pressure oxidation;Ge oxidation;High mobility channel;Ge/GeO2 interface;Interface trap density
doi:10.33079/jomm.20030202
2020年,第3卷,第2期:20030202 | PDF
Published: June 29, 2020
Views:769
Abstract: On the basis of thermodynamic and kinetic consideration of Ge-O system, high-pressure oxidation (HPO) on Ge was proposed to suppress the GeO desorption during the thermal oxidation and significant ...
2020年,第3卷,第2期:20030203 | PDF
Research Article
Published: June 29, 2020
Views:1192
Abstract: China's IC industry has been flourishing in recent years, huge market demand together with government investments are the major driving forces for this development. The status and development momen...
DFM: “Design for Manufacturing” or “Design Friendly Manufacturing”
Authors: Wenzhan Zhou, Hung-Wen Chao, Yu Zhang et al.
Institution:Shanghai Huali Integrated Circuit Corp, China
Keywords:Design for Manufacturing (DFM);Design Friendly Manufacturing;EUV Lithography;Source Mask Optimization (SMO);Design Technology Co-optimization (DTCO);Process Window;Process Variation
doi:10.33079/jomm.20030101
2020年,第3卷,第1期:20030101 | PDF
Research Article
Published: March 30, 2020
Views:1387
Abstract: As the IC manufacturing enter sub 20nm tech nodes, DFM become more and more important to make sure more stable yield and lower cost. However, by introducing newly designed hardware (1980i etc.) pro...
Metrology Challenges in 3D NAND Flash Technical Development and Manufacturing
Authors: Wei Zhang, Jun Xu, Sicong Wang et al.
Institution:Yangtze Memory Technologies Co., Ltd., Wuhan
Keywords:3D NAND;Metrology;Semiconductor;HAR;Process Control
doi:10.33079/jomm.20030102
2020年,第3卷,第1期:20030102 | PDF
Research Article
Published: March 30, 2020
Views:1621
Abstract: 3D NAND technical development and manufacturing face many challenges to scale down their devices, and metrology stands out as much more difficult at each turn. Unlike planar NAND, 3D NAND has a thr...
Key Process Approach Recommendation for 5 nm Logic Process Flow with EUV Photolithography
Authors: Yushu Yang, Yanli Li, Qiang Wu et al.
Institution:Shanghai IC R&D Center, 497, Gaosi Road, Zhangjiang Hi, -, Tech Park, Shanghai
Keywords:5 nm Logic Process;EUV;metal gate cut;SAC;BAC;self-aligned LELE
doi:10.33079/jomm.20030103
2020年,第3卷,第1期:20030103 | PDF
Research Article
Published: March 30, 2020
Views:1631
Abstract: 5 nm logic process is the current leading-edge technology which is under development in world-wide leading foundries. In a typical 5 nm logic process, the Fin pitch is 22~27 nm, the contact-poly pi...