Authors: Litho World
Keywords：EDA；China
doi：10.33079/jomm.19020305
Abstract：
China's IC industry has been flourishing in recent years, huge market demand together with government investments are the major driving forces for this development. The status and development momen...
Authors: Qingchen Cao, Tianhui Li, Shuying Wang et al.
Institution：SiEn (QingDao) Integrated Circuits Co., Ltd
Keywords：Image quality；lithography；OPC model；multi-model
doi：10.33079/jomm.19020304
Abstract：
As the process comes into 28nm node and below, lithography struggles stronger between high resolution (high NA) and enough process window especially for hole layers (Contacts and Vias). Taking more...
Authors: Jeff Shu
Institution：GLOBALFOUNDRIES
Keywords：self-aligned multiple patterning；SAMP；self-aligned double patterning；SADP；self-aligned quadruple patterning；SAQP；line cut；edge placement error
doi：10.33079/jomm.19020301
Abstract：
Self-aligned multiple patterning (SAMP) can enable the semiconductor scaling before EUV lithography becomes mature for industry use. Theoretically any small size of pitch can be achieved by repeati...
Authors: Yanli Li, Qiang Wu, Shoumian Chen
Institution：Shanghai IC R, &, D Center, 497, Gaosi Road, Zhangjiang Hi, -, Tech Park, China
Keywords：5nm design rule；minimum area；minimum exposure latitude；aberration；shadowing effect
doi：10.33079/jomm.19020406
Abstract：
5 nm logic technology node is believed to be the first node that will adopt Extremely Ultra-Violet (EUV) lithography on a large scale. We have done a simulation study for typical 5 nm logic design ...
Authors: Man Zhang, Liangping Xia, Suihu Dang et al.
Institution：Yangtze Normal University
Keywords：Flexible；pressure sensor；poly(dimethylsiloxane)；soft nanoimprint lithography；triboelectrostatic charges
doi：10.33079/jomm.19020302
Issue 3: 19020302, 2019
|
PDF
Published: Sept. 26, 2019
Views：2976
Abstract：
This paper proposed a flexible pressure sensor based on poly(dimethylsiloxane) nanostructures film and report an efficient, simple, and low-cost fabrication strategy via soft nanoimprint lithograph...
Authors: Lijun Zhu, Jianhua Zhao
Institution：Cornell University
Keywords：Keyword: Chemical stability, Perpendicular magnetic anisotropy, Spintronics, Wet etching
doi：10.33079/jomm.19020303
Issue 3: 19020303, 2019
|
PDF
Published: Sept. 26, 2019
Views：2356
Abstract：
Ferromagnetic films of L10-ordered MnGa have shown promise not only in the applications in ultrahigh-density magnetic recording and spintronic memories, oscillators, and sensors, ...
