CN: DemoJournal-CN
ISSN: DemoJournal-ISSN
Research Article Archive • Versions 6 Vol 1 (1) : 18010102 2018
Download
Silicon Nitride Etch via Oxidation Reaction in Fluorocarbon/Oxygen Plasma: A First-Principle Study
Yu-Hao Tsai, Du Zhang, Mingmei Wang
： 2018 - 07 - 20
： 2018 - 09 - 30
5836 122 0
CSCD  ·  Badiu Scholar
References
Journal of Microelectronic Manufacturing

  • Copyright@JoMMPublish