Welcome to Journal of Microelectronic Manufacturing!
2018
Volume 1, Issue 1
  • Published: Nov. 29, 2018
  • Supervised by:None
  • Hosted by:None
  • Published by:JoMM Editorial Office

Research Article top

Foreword to the Journal of Microelectronic Manufacturing
Authors: Tianchun Ye
Institution:Institute of Microelectronics of Chinese Academy of Science
doi:10.33079/jomm.18010101
Issue 1: 18010101, 2018 | PDF
Research Article
Published: Sept. 30, 2018
Views:1348
Silicon Nitride Etch via Oxidation Reaction in Fluorocarbon/Oxygen Plasma: A First-Principle Study
Authors: Yu-Hao Tsai, Du Zhang, Mingmei Wang
Institution:TEL Technology Center
Keywords:3D-NAND;oxide;nitride;oxynitride;plasma etch;first-principle
doi:10.33079/jomm.18010102
Issue 1: 18010102, 2018 | PDF
Research Article
Published: Sept. 30, 2018
Views:2451
Abstract: Conducting all-in-one etch process for 3D-NAND fabrication requires close etch rate (E/R) for SiO2 and Si3N4; however, to attain comparable and high etch rate for b...
A Novel High Volume Manufacturing Method for Defect-free and High-yield SiN Micro-sieve Membranes
Authors: Yansong Liu, Chao Zhao, Lisong Dong et al.
Institution:Key Laboratory of Microelectronic Devices, &, Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences
Keywords:micro-sieves;high volume manufacturing;defect free;high yield
doi:10.33079/jomm.18010103
Issue 1: 18010103, 2018 | PDF
Research Article
Published: Sept. 30, 2018
Views:1210
Abstract: Micro-sieves have been widely used in medical treatment, quarantine, environment, agriculture, pharmacy and food processing. However, the manufacturing and yield improvement have been difficult due...
Analysis of Current Research Status of Plasma Etch Process Model
Authors: Xiaoting Li, Rui Chen, Lei Qu et al.
Institution:North China University of Technology
Keywords:plasma etching;etching model;simulation
doi:10.33079/jomm.18010104
Issue 1: 18010104, 2018 | PDF
Research Article
Published: Sept. 30, 2018
Views:1971
Abstract: This paper summarizes the status of the plasma etch process modeling research. It mainly introduces typical etching models employing the analytical method, geometric method, system identification m...
Current Status of the Integrated Circuit Industry in China —— IC Design Industry
Authors: Lithotechsolutions.org
doi:10.33079/jomm.18010105
Issue 1: 18010105, 2018 | PDF
Research Article
Published: Sept. 30, 2018
Views:8346
Abstract: China's IC industry has been flourishing in recent years, huge market demand together with government investments are the major driving forces for this development. The status and development momen...