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Vol 1 (1) : 18010102 2018
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Silicon Nitride Etch via Oxidation Reaction in Fluorocarbon/Oxygen Plasma: A First-Principle Study
Yu-Hao Tsai
,
Du Zhang
,
Mingmei Wang
DOI:
10.33079/jomm.18010102
: 2018 - 07 - 20
: 2018 - 09 - 30
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