Welcome to Journal of Microelectronic Manufacturing!
2021
Volume 4, Issue 3
  • Published: Sept. 30, 2021
  • Supervised by:None
  • Hosted by:None
  • Published by:JoMM Editorial Office

Research Article top

New Progress of China’s EDA Industry
Keywords:EDA
doi:10.33079/jomm.21040302
Issue 3, 2021 | PDF
Research Article
Published: Dec. 3, 2021
Views:717
Abstract: China's IC industry has been flourishing in recent years, huge market demand together with government investments are the major driving forces for this development. The status and development momen...
A Novel R2R Control Strategy with Virtual Structure Deployment and Rolling Wave Control Plan
Authors: Chang Xu
Institution:Fujian Jinhua Integrated Circuit Co, ., Ltd, ., Jinjiang, Quanzhou, Fujian
Keywords:R2R;manufacturing;control;circuit design;virtual metrology
doi:10.33079/jomm.21040301
Issue 3, 2021 | PDF
Research Article
Published: Sept. 18, 2021
Views:1001
Abstract: This paper presents an innovative R2R (run to run) control strategy. This novel approach has made use of circuit design structure through virtually put up the structure before reach the actual stru...