Current Status of the Integrated Circuit Industry in China ― IC Special Equipment Industry

Authors: Lithotechsolutions.org
doi：10.33079/jomm.19020105

Laser-Driven Light Sources for Nanometrology Applications

Authors: Huiling Zhu, Paul Blackborow
Institution：Energetiq Technology, Inc, ., 7, Constitution Way, Woburn
Keywords：laser-driven；brightness；broadband；deep-UV；metrology；LDLS
doi：10.33079/jomm.19020104

Nitridation-Etch of Silicon Oxide in Fluorocarbon/Nitrogen Plasma: A Computational Study

Authors: Du Zhang, Yu-Hao Tsai, Hojin Kim et al.
Institution：TEL Technology Center, America, LLC, 255, Fuller Road, Suite, 214, Albany
Keywords：3D-NAND；oxide；nitride；oxynitride；plasma etch；molecular dynamics；quantum chemistry
doi：10.33079/jomm.19020103

Hamamatsu’s Products for Optical Inspection, Metrology and Monitoring to Improve Yield and Accuracy for Semiconductor Processes

Authors: Chenghao Xiang, Xusheng Zhou
Institution：Hamamatsu Photonics (China) Co., Ltd., Beijing
Keywords：optical semiconductor inspection/metrology/monitoring solutions；image sensor；light sources；mini-spectrometer；photomultiplier tubes/modules
doi：10.33079/jomm.19020102

The Variables and Invariants in the Evolution of Logic Optical Lithography Process

Authors: Qiang Wu
Institution：Shanghai IC R, &, D Center, Shanghai
Keywords：image projection photolithography；imaging contrast；exposure latitude；mask error factor；linewidth uniformity；chemically amplified photoresist；phase shifting mask；optical proximity correction；and photoacid diffusion length
doi：10.33079/jomm.19020101